1¡¢WLCSPÊÇʲô£¿
WLCSP£¨Wafer Level Chip Scale Package£¬¾§Ô²¼¶Ð¾Æ¬¼¶·â×°£©ÊÇÒ»ÖÖÏȽøµÄ¼¯³Éµç··â×°¼¼Êõ£¬ÆäÌØµãÊÇÖ±½ÓÔÚ¾§Ô²ÉÏÍê³É·â×°£¬×îÖÕ·â×°³ß´ç½Ó½üоƬ±¾ÉíµÄ´óС¡£ÕâÖÖ¼¼Êõͨ¹ýÔÚ¾§Ô²ÉϽøÐÐÖØÐ²¼ÏߺÍ͹µãÖÆÔ죬ʵÏÖ¸ßÃܶȻ¥ÁªºÍСÐÍ»¯·â×°£¬¹ã·ºÓ¦ÓÃÓÚÒÆ¶¯É豸¡¢Ïû·Ñµç×Ӻ͸ßÐÔÄܼÆËãÁìÓò¡£
2¡¢WLCSPµÄ·ÖÀࣿ
ÉÈÈëÐ;§Ô²¼¶Ð¾Æ¬·â×°£¨Fan - In WLCSP£©£ºÒý½Å´ÓоƬËÄÖÜÒý³ö£¬³ÊÉÈÐÎÒýÈ뵽оƬµ×²¿£¬¾ßÓгߴçС¡¢³É±¾µÍ¡¢É¢ÈÈÐԺõÈÌØµã£¬µ«Òý½ÅÊýÁ¿½ÏÉÙ£¬ÎÞ·¨ÊµÏָ߼¯³É¶ÈоƬ·â×°¡£
ÉȳöÐ;§Ô²¼¶Ð¾Æ¬·â×°£¨Fan - Out WLCSP£©£ºÒý½Å´ÓоƬµ×²¿Òý³ö£¬³ÊÉÈÐÎÒý³öµ½Ð¾Æ¬Íⲿ£¬Òý½ÅÊýÁ¿¶à£¬µç·Éè¼ÆÁé»î£¬Äܹ»½«¶à¸öоƬ·âװΪһÌ壬ÔÚÂú×ãС³ß´çÒªÇóµÄͬʱ¿ÉÒÔʵÏÖ¸ü¸ß¼¯³É¶È¡£
3¡¢WLCSP¹¤ÒÕFlow
1. ¾§Ô²×¼±¸
¾§Ô²ÇåÏ´£ºÈ¥³ý±íÃæµÄ¿ÅÁ£¡¢ÓлúÎïºÍ½ðÊô²ÐÁô¡£
±íÃæ´¦Àí£ºÍ¨¹ý»¯Ñ§»òÎïÀí·½·¨¸ÄÉÆ¾§Ô²±íÃæµÄ¸½×ÅÐÔÄÜ¡£
2. ¶Û»¯²ã³Á»ý
ÔÚ¾§Ô²±íÃæ³Á»ýÒ»²ã¶Û»¯²ÄÁÏ£¨ÈçSiO?»òSiN£©£¬ÓÃÓÚ±£»¤ÄÚ²¿µç·²¢Ìṩ¾øÔµ¡£³£Ó÷½·¨£ºPECVD£¨µÈÀë×ÓÌåÔöÇ¿»¯Ñ§ÆøÏà³Á»ý£©¡£
3. º¸ÅÌ¿ª´°
ʹÓùâ¿Ì¼¼ÊõÔÚ¶Û»¯²ãÉÏ¿ª´°£¬Â¶³öÂÁº¸ÅÌ¡£Í¨¹ýʪ·¨Ê´¿Ì»ò¸É·¨Ê´¿ÌʵÏÖ¾«È·Í¼°¸»¯¡£
4. ÖØÐ²¼Ïߣ¨RDL, Redistribution Layer£©
ÔÚ¾§Ô²±íÃæÖÆ×÷ÖØÐ²¼Ï߲㣬½«Ô±¾·ÖÉ¢µÄСº¸ÅÌÖØÐÂÅÅÁгɸü´óµÄº¸ÅÌÕóÁС£²½ÖèÈçÏ£¬Ê×ÏȳÁ»ýµ¼µç²ÄÁÏ£¨ÈçÍ»òÂÁ£©£¬Æä´Î¿ÌÊ´ÐγÉËùÐèµÄ²¼Ïßͼ°¸£¬×îºó±íÃæ¶Û»¯´¦Àí¡£
5. ͹µãϽðÊô»¯£¨UBM, Under Bump Metallization£©
ÔÚÖØÐ²¼Ïß²ãµÄº¸Å̱íÃæ³Á»ýÒ»²ã»ò¶à²ã½ðÊô±¡Ä¤£¬ÓÃÓÚÌá¸ßº¸ÇòÓ뺸ÅÌÖ®¼äµÄÕ³¸½Á¦ºÍµ¼µçÐÔ¡£³£¼û²ÄÁÏ£ºTi/Cu/Ni/Au¡£
6. º¸ÇòÖ²Çò
½«º¸Çò£¨ÈçSnAgCuºÏ½ðº¸Çò£©·ÅÖÃÔÚÖØÐ²¼Ïß²ãµÄº¸ÅÌÉÏ¡£º¸Çò¿ÉÒÔͨ¹ýÓ¡Ë¢·¨¡¢µç¶Æ·¨»ò»ØÁ÷º¸½Ó·¨¹Ì¶¨¡£
7. ¾§Ô²Çиî
ʹÓü¤¹âÇиî»ò»®Æ¬»ú½«·â×°ºÃµÄ¾§Ô²·Ö¸î³Éµ¥¸öоƬ¡£×¢Òâ±£³ÖÇиî·¾¶²»»áÆÆ»µÐ¾Æ¬¹¦ÄÜ¡£
8. ³ÉÆ·²âÊÔ
¶ÔÇиîºóµÄµ¥¸öоƬ½øÐÐµçÆøÐÔÄܲâÊÔºÍÍâ¹Û¼ì²é¡£²âÊÔÄÚÈݰüÀ¨µ¼Í¨ÐÔ¡¢¾øÔµÐÔ¡¢º¸ÇòλÖÃÆ«²îµÈ¡£
9. ×îÖÕ·â×°
½«ºÏ¸ñµÄоƬװÈë×îÖյİü×°ÔØÌåÖУ¨ÈçËÜÁÏ·â×°Ìå»ò²£Á§»ù°å£©¡£½øÐÐÃÜ·â´¦ÀíÒÔ·ÀÖ¹Íâ½ç»·¾³µÄÓ°Ïì¡£